Pesticide Registration Certificate No.: PD20131548

Registration Certificate Holder: Hebi Quanfeng Biotechnology Co., Ltd

Pesticide name: ethephon

Dosage form: aqueous

Toxicity: Low toxicity

Effective ingredients and their content: Ethephrel 40%

Technical requirements for use:

1. Spray the top when corn leaves 6-12. 2. Do not apply pesticides on windy days or when rainfall is expected to occur within 1 hour. 3. Use the crop up to once per season.

Precautions:

1. This product is a highly active plant growth regulator. It should be sprayed vigorously rather than weakly according to the crop growth trend, and strictly follow the instructions for use to avoid causing pesticide damage; 2. This product is prone to decomposition when exposed to alkali and cannot be mixed with alkaline substances; 3. When using this product, protective clothing and gloves should be worn to avoid inhaling medication. Do not eat or drink during the application period. Wash hands and face promptly after applying medication; 4. Wastewater from cleaning equipment should not be discharged into rivers, ponds, or other water sources. Waste should be properly treated and not discarded randomly or used for other purposes; 5. Avoid contact with pregnant and lactating women.

First aid measures for poisoning:

It has a strong irritating effect on the skin, mucous membranes, and eyes. Emergency treatment: If accidentally inhaled, move the patient to a well ventilated area. If it accidentally comes into contact with the skin or splashes into the eyes, it should be immediately rinsed with plenty of water for at least 15 minutes. If taken by mistake, immediately send to the hospital for symptomatic treatment and do not induce vomiting.

Storage and transportation methods:

1. This product should be stored in a dry, cool, ventilated, and rainproof place, away from ignition or heat sources. 2. Keep out of reach of children and lock. Do not store or transport with other commodities such as food, beverages, feed, etc.

Quality assurance period: 2 years